Mercury series measure total pitch (distance between any two points) of various patterns processed on glass substrates. In the FPD manufacturing process represented by LCD, before manufacturing one substrate is completed, many layers of patterns are overlaid to form the substrate. These patterns are designed in submicron size and FPD for smartphones especially requires finer patterning. This system support Quality control by measuring total pitch of patterns formed on substrates and serves to improve the yield and quality of LCD in the whole factory.
This system achieves the highest accuracy for total pitch measurement and manages production of displays equivalent to or greater than 300 pixels per inch (ppi).
High speed measurement is available as an option.
Immediate use of Inspection data base for quality control
Measurement data is available for upstream system to support making decisions for Q.C.
Fine pattern measurement
This system measures dimension of fine patterns as well.
Pattern position (total pitch) measurements of TFT and CF substrates.
Photo mask : Total pitch measurement of photo mask
Metal mask : Total pitch measurement of metal mask
OELD : Pattern position (total pitch) measurement of EL substrate
Various photo mask measurements, MEMS measurement